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Aluminum Polishing Slurry
We supply colloidal silica-based slurries for aluminum substrate polishing with high removal rate and low-defect. The slurries include acidic AL-1101 and alkaline AL-1001.
The products can be widely used in the processes of architecture, package, cell phone and tablet shell,etc.

Specification

Product Type

AL-1101

AL-1001

Advantages

High removal rate

Excellent corrosion inhibition

Excellent corrosion inhibition

High stability

Low residue

Low residue

No scratch

No scratch

Low metal contamination

Low metal contamination

pH 2-3

pH 9-11

Solid Content:40%;  Particle Size:80-110nm

Package

Net Weight:250kg/drum.